Global Lithography Light Source Market Set for Rapid Growth Driven by Advanced Semiconductor Demands

The global market for light sources used in lithography techniques was valued at $2.1 billion in 2024 and is forecasted to reach $4.3 billion by 2032, reflecting a compound annual growth rate (CAGR) of 9.1% over the period from 2025 to 2032. North America's segment was estimated at $740 million in 2024 and is expected to grow to $1.5 billion by 2032, with a CAGR of 9.4%. These light sources are vital in semiconductor manufacturing, facilitating the precise patterning of integrated circuits by emitting ultraviolet light at specific wavelengths, such as deep ultraviolet (DUV) and extreme ultraviolet (EUV). The adoption of EUV technology is accelerating, especially for producing chips at nodes below 10nm, where it becomes essential for achieving higher resolution. Leading companies like Cymer (a division of ASML) and Gigaphoton are investing heavily in advancing their EUV systems, with recent models reaching power outputs of 250W to enhance throughput for advanced nodes like 3nm. The growth of the market is driven by the ongoing push towards smaller transistor geometries, increasing demand for EUV sources, and government initiatives promoting domestic semiconductor manufacturing. N...